Chemical Vapor Deposition
Plasma Enhanced Chemical Vapor Deposition (PECVD)
Plasma-therm SLR730
- Materials available: Silicon dioxide, amorphous silicon
- Substrate compatibility: 125mm wafers only
- Description: The SLR730 is an RF powered three-wafer carousel system that ionizes silane and nitrous oxide so they can chemically react to form silicon dioxide on the wafer surface.