<< Go Back

Photolithography

Tools/Materials

• Substrate compatibility: 125mm for automated spin-coating; up to 150mm wafers for manual desktop spin-coating

Positive Resist Spin Coaters

• Eaton 6000 2-track cassette-to-cassette coater with bake system
  • Track 1 configured for 125mm wafers
  • Track 2 configured for 100mm wafers with a hot and cool plate on each track.
  • Resists available
    • Clariant’s positive photoresist AZ4110 only

• Specialty Coating Systems G3P-8 positive resist coater
  • Resists available
    • Clariant’s positive photoresist AZ4110, AZ4330, AZ4620

Negative Resist Spin Coaters

• MTI MultiFab cassette coater with bake system
  • Single track configured for 125mm wafers to dispense, bake, and spray develop BCB.
  • Negative resist formulations
    • Benzocyclobutene (BCB)
      • 4022-35, 4024-40, 4026-46, XU35075
• Specialty Coating Systems G3P-8 negative resist coater
  • Negative resist formulations
    • Benzocyclobenzene (BCB)
      • 4022-35, 4024-40, 4026-46, XU35075
    • Polyimide (PI)
      • PI 2721
    • SU-8
      • SU8 2035, 2050, 2075, 2100

UV Exposure Tools

• Suss microtec MA150
  • 350 watts
  • Cassette driven aligner
  • Configured for 125mm wafers with proximity, soft, and hard contact modes * Provides resolution down to two microns
• Suss microtec MA150*
  • 1000 watts
  • Cassette driven aligner
  • Configured for 150mm wafers with proximity, soft, and hard contact modes
  • Provides resolution down to two microns

Baking/Curing ovens

• Blue M DCC-256E-MP oven
  • This 300ºC capable oven is used to bake then cure either BCB or polyimide. The BCB curing process utilizes the nitrogen purge option to reduce the oxygen concentration to 100ppm
• Blue M DCC-206C oven
  • This 250ºC capable oven is used to bake then cure either BCB or polyimide. The BCB curing process utilizes the nitrogen purge option to reduce the oxygen concentration to 100ppm

Metrology Tools

• Nanometrics Nanospec AFT
  • This reflectometer measures transparent films on wafers up to 125mm wafer.
• Vickers photoplan CD measuring tool
  • This microscope/micrometer assembly measures the line widths of features to determine the deviation from the desired width.
• Nikon Ultrastation 3 with Paxcam accessory*
  • This microscope/digital assembly provides visual observation of developed features as well as digital capture and retrieval of images.